asia electronics technology is a wet process equipment company in the semiconductor wafer manufacturing industry, which focuses on wafer front-end wet etching and cleaning technology. we are one of the leading companies to promote the localization of semiconductor advanced equipment in china. we have set up r&d centers in wuxi, jiangsu, and overseas. as a high-tech enterprise with independent intellectual property rights, we have applied invention patents for the core technologies and our core products including 8"and 12" bench/single wet etching cleaning tool. we are committed to providing customers with more competitive products and services through diversified and personalized solutions. to better serve our customer, we have service teams in china's major cities. |
mission
vision
core values
provide customer with more competitive products and services
to be the leading semiconductor wet process equipment provider in china
product-centic: concentration , quality , cost , perfection , fast
customer first: quick response, problem solving, customer oriented, and win customer trust
teamwork: be practical and realistic , integrity , dedication, mutual respect and trust
delivery mission: fighting , never give up , and fast execution
equipment model : | df-3000b |
equipment type : | cassette less/type |
wafer size : | 300mm |
configuration : | 8~12 baths,2~6 robots (according to the demand) |
megasonic /ultrasonic | |
bath over-temperature protection, equipped with leak sensor | |
multi-level wafer protection | |
ccss or lcss supply | |
automatic supply and support multiple concentration ratio | |
advanced marangoni dry technology | |
temperature control, concentration control, flow control, pressure control | |
chemical/diw recycle & drain | |
reliability : | uptime≥98% breakage≤1/100000 |
mtbf≥650 hours mttr≤3 hours | |
software control : | pc plc gui, support schedule, eap,fdc etc |
equipment model: | fy-3000s |
wafer size: | 300mm |
chamber: | 4~24 chambers(according to the demand) |
vacuum or grip | |
4~5 dispensers,2~3 chemicals | |
exhaust separation: acid, alkali, organic drain separation etch chemical | |
e f e m : | 2 or 4 smif/foup, 1 index robot, 1or 2 wtr |
chemical supply: | ccss or lcss supply |
circulation pump | |
heating control, concentration control, flow control, pressure control | |
chemical / diw, drain & recycle | |
configuration: | ionizer / o3 / hd camera |
reliability: | uptime≥98% breakage≤1/100000 |
mtbf≥500 hours mttr≤3 hours | |
software control: | pc plc gui, support eap, fdc etc |
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